Invention Grant
- Patent Title: Method for manufacturing 1-halo-2-fluoroethylene
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Application No.: US17544109Application Date: 2021-12-07
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Publication No.: US12054445B2Publication Date: 2024-08-06
- Inventor: Tomo Otsuka , Tsubasa Nakaue , Kazuhiro Takahashi
- Applicant: DAIKIN INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: DAIKIN INDUSTRIES, LTD.
- Current Assignee: DAIKIN INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP 19107969 2019.06.10
- Main IPC: C07C17/358
- IPC: C07C17/358 ; C07C17/383

Abstract:
A method for efficiently obtaining trans-1-halo-2-fluoroethylene (E-isomer) and/or cis-1-halo-2-fluoroethylene (Z-isomer) is provided. The method for producing trans-1-halo-2-fluoroethylene (E-isomer) and/or cis-1-halo-2-fluoroethylene (Z-isomer) includes supplying a composition containing trans-1-halo-2-fluoroethylene (E-isomer) and/or cis-1-halo-2-fluoroethylene (Z-isomer) to a reactor to perform isomerization between the trans-1-halo-2-fluoroethylene (E-isomer) and the cis-1-halo-2-fluoroethylene (Z-isomer) in a liquid phase by performing light irradiation in the presence of a photosensitizer.
Public/Granted literature
- US20220089513A1 METHOD FOR MANUFACTURING 1-HALO-2-FLUOROETHYLENE Public/Granted day:2022-03-24
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