Invention Grant
- Patent Title: Hydrogen peroxide decomposition inhibitor
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Application No.: US17617207Application Date: 2020-06-12
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Publication No.: US12054659B2Publication Date: 2024-08-06
- Inventor: Hideki Takahashi , Erina Ogihara , Pen-Nan Liao , Po-Heng Wu , Yi Li
- Applicant: Kanto Kagaku Kabushiki Kaisha
- Applicant Address: JP Tokyo
- Assignee: Kanto Kagaku Kabushiki Kaisha
- Current Assignee: Kanto Kagaku Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: McDonnell Boehnen Hulbert & Berghoff LLP
- Priority: JP 19109266 2019.06.12
- International Application: PCT/JP2020/023200 2020.06.12
- International Announcement: WO2020/251016A 2020.12.17
- Date entered country: 2021-12-07
- Main IPC: C09K13/06
- IPC: C09K13/06 ; C09K15/20 ; C09K15/30 ; C09K15/32 ; H01L21/311
Abstract:
The present invention addresses the problem of providing a decomposition inhibitor for inhibiting the decomposition of hydrogen peroxide included in an etching liquid composition for titanium nitride.
The present invention relates to a decomposition inhibitor that is used to inhibit the decomposition of hydrogen peroxide included in an etching liquid composition for titanium nitride and that includes at least one compound selected from among azole compounds, aminocarboxylic acid compounds, and phosphonic acid compounds as an active component.
The present invention relates to a decomposition inhibitor that is used to inhibit the decomposition of hydrogen peroxide included in an etching liquid composition for titanium nitride and that includes at least one compound selected from among azole compounds, aminocarboxylic acid compounds, and phosphonic acid compounds as an active component.
Public/Granted literature
- US20220340814A1 Hydrogen Peroxide Decomposition Inhibitor Public/Granted day:2022-10-27
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