Invention Grant
- Patent Title: Coating composition for photoresist underlayer
-
Application No.: US17138069Application Date: 2020-12-30
-
Publication No.: US12055854B2Publication Date: 2024-08-06
- Inventor: Jin Hong Park , Yoo-Jin Ghang , Suwoong Kim , You Rim Shin , Jung June Lee , Jae Hwan Sim
- Applicant: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Applicant Address: KR Cheonan-si
- Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Current Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Current Assignee Address: KR Cheonan-si
- Agency: CANTOR COLBURN LLP
- Main IPC: G03F7/11
- IPC: G03F7/11 ; C08F20/32 ; C08G63/91 ; C09D133/14 ; C09D167/02 ; G03F7/038
Abstract:
A coating composition comprising a crosslinkable polyester polymer comprising an isocyanurate group and a crosslinkable group; a crosslinker; and an acid catalyst, wherein at least one of the crosslinkable polyester polymer and the crosslinker comprises an iodine-containing polymer.
Public/Granted literature
- US20210200093A1 COATING COMPOSITION FOR PHOTORESIST UNDERLAYER Public/Granted day:2021-07-01
Information query
IPC分类:
