Invention Grant
- Patent Title: Apparatus for treating substrate and apparatus for measuring concentration
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Application No.: US17957428Application Date: 2022-09-30
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Publication No.: US12057335B2Publication Date: 2024-08-06
- Inventor: Sang Min Lee , Jin Se Park , Ki Hoon Choi
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Chungcheongnam-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR 20210133588 2021.10.08
- Main IPC: G01N1/10
- IPC: G01N1/10 ; G01N1/20 ; H01L21/67 ; H01L21/66

Abstract:
Provided is a concentration measuring apparatus, which measures a concentration of a fluid under a high-pressure environment, such as an environment in which a supercritical fluid is provided. The concentration measuring apparatus includes: a concentration meter for measuring a concentration of a first fluid contained in a fluid in the measurement line; a sampling line for transferring a process fluid of a processing space in which a substrate is treated in a high-pressure environment to the measurement line; a control valve for opening and closing the sampling line; a fluid pressure regulator installed downstream the control valve in the sampling line and configured to adjust the passing fluid to a set pressure; and a decompression tank installed between the sampling line and the measurement line.
Public/Granted literature
- US20230111149A1 APPARATUS FOR TREATING SUBSTRATE AND APPARATUS FOR MEASURING CONCENTRATION Public/Granted day:2023-04-13
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