Invention Grant
- Patent Title: Using cumulative heat amount data to qualify hot plate used for postexposure baking
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Application No.: US17572432Application Date: 2022-01-10
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Publication No.: US12062542B2Publication Date: 2024-08-13
- Inventor: Chia-Cheng Chao , Chung-Cheng Wang , Chun-Kuang Chen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: HAYNES AND BOONE, LLP
- The original application number of the division: US15708791 2017.09.19
- Main IPC: H01L21/027
- IPC: H01L21/027 ; H01L21/66 ; H01L21/67 ; H05B1/02 ; H05B3/24 ; H05B3/68

Abstract:
A test wafer is placed inside a baking module and is baked. Via one or more temperature sensors, a cumulative heat amount delivered to the test wafer during the baking is measured. The measured cumulative heat amount is compared with a predefined cumulative heat amount threshold. In response to the comparing indicating that the measured cumulative heat amount is within the predefined cumulative heat amount threshold, it is determined that the baking module is qualified for actual semiconductor fabrication. In response to the comparing indicating that the measured cumulative heat amount is outside of the predefined cumulative heat amount threshold, it is determined that the baking module is not qualified for actual semiconductor fabrication.
Public/Granted literature
- US20220139698A1 Using Cumulative Heat Amount Data To Qualify Hot Plate Used For Postexposure Baking Public/Granted day:2022-05-05
Information query
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