Invention Grant
- Patent Title: Semiconductor device and manufacturing method thereof
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Application No.: US18167867Application Date: 2023-02-12
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Publication No.: US12062640B2Publication Date: 2024-08-13
- Inventor: Chen-Hua Yu , Wen-Chih Chiou
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- The original application number of the division: US16171343 2018.10.25
- Main IPC: H01L25/065
- IPC: H01L25/065 ; H01L21/56 ; H01L21/822 ; H01L23/00 ; H01L23/31 ; H01L23/532 ; H01L23/538 ; H01L25/00

Abstract:
A semiconductor device including a first integrated circuit component, a second integrated circuit component, a third integrated circuit component, and a dielectric encapsulation is provided. The second integrated circuit component is stacked on and electrically coupled to the first integrated circuit component, and the third integrated circuit component is stacked on and electrically coupled to the second integrated circuit component. The dielectric encapsulation is disposed on the second integrated circuit component and laterally encapsulating the third integrated circuit component, where outer sidewalls of the dielectric encapsulation are substantially aligned with sidewalls of the first and second integrated circuit components. A manufacturing method of the above-mentioned semiconductor device is also provided.
Public/Granted literature
- US20230187415A1 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2023-06-15
Information query
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