Invention Grant
- Patent Title: HEMT transistor with adjusted gate-source distance, and manufacturing method thereof
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Application No.: US17703779Application Date: 2022-03-24
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Publication No.: US12062715B2Publication Date: 2024-08-13
- Inventor: Ferdinando Iucolano
- Applicant: STMICROELECTRONICS S.R.L.
- Applicant Address: IT Agrate Brianza
- Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee Address: IT Agrate Brianza
- Agency: Seed IP Law Group LLP
- Priority: IT 2018000010448 2018.11.20
- The original application number of the division: US16688974 2019.11.19
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/40 ; H01L29/778 ; H01L29/78

Abstract:
An HEMT includes: a heterostructure; a dielectric layer on the heterostructure; a gate electrode, which extends throughout the thickness of the dielectric layer; a source electrode; and a drain electrode. The dielectric layer extends between the gate electrode and the drain electrode and is absent between the gate electrode and the source electrode. In this way, the distance between the gate electrode and the source electrode can be designed in the absence of constraints due to a field plate that extends towards the source electrode.
Public/Granted literature
- US20220216333A1 HEMT TRANSISTOR WITH ADJUSTED GATE-SOURCE DISTANCE, AND MANUFACTURING METHOD THEREOF Public/Granted day:2022-07-07
Information query
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