Invention Grant
- Patent Title: Liquid processing apparatus and liquid processing method
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Application No.: US18129150Application Date: 2023-03-31
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Publication No.: US12070769B2Publication Date: 2024-08-27
- Inventor: Chikara Nobukuni , Tomoaki Ojima , Takuya Itahashi , Ryoichi Horiguchi , Shota Wakayama
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald. L. Meyer; Tanya E. Harkins
- Priority: JP 19123898 2019.07.02
- The original application number of the division: US16918678 2020.07.01
- Main IPC: B05C3/02
- IPC: B05C3/02 ; B05C11/10 ; H01L21/67

Abstract:
A liquid processing apparatus includes: a tank configured to store a processing liquid supplied from a processing liquid supply source; a circulation passage connected to the tank; a pump installed at the circulation passage; a plurality of liquid processors configured to perform liquid processing on a substrate; and a plurality of supply passages configured to supply the processing liquid to the plurality of liquid processors respectively, wherein the circulation passage includes a main passage portion provided with the pump, and a first branch passage portion and a second branch passage portion branching from the main passage portion, and the processing liquid flowing out from the tank passes through the main passage portion, then flows into the first branch passage portion and the second branch passage portion, and then returns to the tank through the first branch passage portion and the second branch passage portion.
Public/Granted literature
- US20230234091A1 LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD Public/Granted day:2023-07-27
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