Invention Grant
- Patent Title: Systems and methods for drilling vias in transparent materials
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Application No.: US17272155Application Date: 2019-10-02
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Publication No.: US12070819B2Publication Date: 2024-08-27
- Inventor: Hisashi Matsumoto , Jan Kleinert , Zhibin Lin
- Applicant: ELECTRO SCIENTIFIC INDUSTRIES, INC.
- Applicant Address: US OR Portland
- Assignee: ELECTRO SCIENTIFIC INDUSTRIES, INC.
- Current Assignee: ELECTRO SCIENTIFIC INDUSTRIES, INC.
- Current Assignee Address: US OR Beaverton
- Agent Edward Scott Trask
- International Application: PCT/US2019/054271 2019.10.02
- International Announcement: WO2020/076583A 2020.04.16
- Date entered country: 2021-02-26
- Main IPC: B23K26/382
- IPC: B23K26/382 ; B23K26/0622 ; B23K26/402 ; B23K103/00

Abstract:
A method for forming a through-via in a substrate having opposing first and second surfaces can include directing a focused beam of laser pulses into the substrate through the first surface of the substrate and, subsequently, through the second surface of the substrate. The focused beam of laser pulses can have a wavelength to which the substrate is at least substantially transparent and a beam waist of the focused beam of laser pulses is closer to the second surface than to the first surface. The focused beam of laser pulses is characterized by a pulse repetition rate, a peak optical intensity at the substrate and an average power at the substrate sufficient to: melt a region of the substrate near the second surface, thereby creating a melt zone within the substrate; propagate the melt zone toward the first surface; and vaporize or boil material of the substrate and located within the melt zone.
Public/Granted literature
- US20210245303A1 SYSTEMS AND METHODS FOR DRILLING VIAS IN TRANSPARENT MATERIALS Public/Granted day:2021-08-12
Information query
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