Invention Grant
- Patent Title: Methods and assemblies related to fabrication of acoustic wave devices
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Application No.: US16653965Application Date: 2019-10-15
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Publication No.: US12074581B2Publication Date: 2024-08-27
- Inventor: Michio Kadota , Shuji Tanaka , Yoshimi Ishii
- Applicant: TOHOKU UNIVERSITY
- Applicant Address: JP Sendai
- Assignee: Skyworks Solutions, Inc.
- Current Assignee: Skyworks Solutions, Inc.
- Current Assignee Address: US CA Irvine
- Agency: Chang & Hale LLP
- Main IPC: H03H9/64
- IPC: H03H9/64 ; H03H3/08 ; H03H9/02 ; H03H9/145 ; H03H9/25

Abstract:
Methods and assemblies related to fabrication of acoustic wave devices. In some embodiments, a method for fabricating an acoustic wave device can include attaching a first surface of a piezoelectric layer, such as a LiTaO3 or LiNbO3 layer, to a handling substrate, and performing a thinning operation on the piezoelectric layer to expose a second surface of a reduced-thickness piezoelectric layer attached to the handling substrate. The method can further include bonding the second surface of the reduced-thickness piezoelectric layer to a first surface of a permanent substrate, and removing the handling substrate from the reduced-thickness piezoelectric layer. The handling substrate can be, for example, a silicon substrate, and the permanent substrate can be, for example, a quartz substrate.
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