Invention Grant
- Patent Title: Multi-gate semiconductor device for memory and method for forming the same
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Application No.: US17377790Application Date: 2021-07-16
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Publication No.: US12075608B2Publication Date: 2024-08-27
- Inventor: Huai-Ying Huang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT LAW
- Agent Anthony King
- Main IPC: H10B10/00
- IPC: H10B10/00 ; G11C11/412

Abstract:
A memory device includes a first SRAM cell, a second SRAM cell, a first inter transistor and a second inter transistor. The first SRAM cell includes two first pull-up transistors, two first pull-down transistors, and two first pass-gate transistors. The second SRAM cell includes two second pull-up transistors, two second pull-down transistors, and two second pass-gate transistors. The first inter transistor and the second inter transistor are electrically connected to the first SRAM cell and the second SRAM cell.
Public/Granted literature
- US20230015575A1 MULTI-GATE SEMICONDUCTOR DEVICE FOR MEMORY AND METHOD FOR FORMING THE SAME Public/Granted day:2023-01-19
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