Disclosed are an air circulation system and a final polishing apparatus including the same. The air circulation system improves the degree of contamination in a final polishing apparatus including a housing formed to accommodate a load unit, an unload unit, and a plurality of polishing units. The air circulation system includes air purification units mounted at positions corresponding to the positions of the load unit, the unload unit, and the plurality of polishing units. The air purification units discharge contaminated air in the housing to the outside of the housing, purify the discharged air, and supply the purified air again into the housing.