Invention Grant
- Patent Title: Coating substrate by polymerization of amine compound and apparatus having polymer coated substrate
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Application No.: US17380931Application Date: 2021-07-20
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Publication No.: US12077646B2Publication Date: 2024-09-03
- Inventor: Sung-Chan Jo , Kyonghoon Lee , John S. Althaus , Hyung Jin Park
- Applicant: Quantum MicroMaterials, Inc.
- Applicant Address: US WA Bellevue
- Assignee: Quantum MicroMaterials, Inc.
- Current Assignee: Quantum MicroMaterials, Inc.
- Current Assignee Address: US WA Bellevue
- Agency: K&L Gates LLP
- Priority: KR 20200008102 2020.01.21 KR 20200008103 2020.01.21 KR 20200008109 2020.01.21 KR 20200008115 2020.01.21 KR 20210058555 2021.05.06 KR 20210058556 2021.05.06
- Main IPC: C08J7/06
- IPC: C08J7/06 ; C23C16/02 ; C23C16/56
Abstract:
This application features a method of forming a polymer layer on the surface of a substrate using a self-initiating monomer. A polymer layer is formed by polymerization of a monomer on a metal layer to fill or cover defects of the metal layer. The metal layer the polymer layer may be used as an airtight material.
Public/Granted literature
- US20220145030A1 COATING SUBSTRATE BY POLYMERIZATION OF AMINE COMPOUND AND APPARATUS HAVING POLYMER COATED SUBSTRATE Public/Granted day:2022-05-12
Information query
