Invention Grant
- Patent Title: Monitoring properties of X-ray beam during X-ray analysis
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Application No.: US17902926Application Date: 2022-09-05
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Publication No.: US12078604B2Publication Date: 2024-09-03
- Inventor: Alexander Krokhmal , Asher Peled
- Applicant: BRUKER TECHNOLOGIES LTD.
- Applicant Address: IL Migdal HaEmek
- Assignee: BRUKER TECHNOLOGIES LTD.
- Current Assignee: BRUKER TECHNOLOGIES LTD.
- Current Assignee Address: IL Migdal HaEmek
- Agency: MEITAR PATENTS LTD.
- Main IPC: G01N23/223
- IPC: G01N23/223

Abstract:
A system for X-ray analysis, includes: (a) an X-ray analysis assembly configured to (i) direct an X-ray beam to impinge on a surface of a sample, and (ii) receive fluorescence radiation excited from the sample in response to the impinged X-ray beam, (b) a target assembly including measurement targets: placed in an optical path between the X-ray analysis assembly and the sample, and configured to move between (i) one or more first positions in which one or more of the measurement targets are positioned in the X-ray beam, and (ii) one or more second positions in which the optical path is unobstructed by the target assembly, and (c) a processor, configured to control movement of the target assembly between the first and second positions, for alternately, (i) monitoring properties of the X-ray beam using the measurement targets, and (ii) performing the X-ray analysis at a measurement site of the sample.
Public/Granted literature
- US20240077437A1 Monitoring properties of X-ray beam during X-ray analysis Public/Granted day:2024-03-07
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