Invention Grant
- Patent Title: Pellicle, exposure original plate, exposure apparatus, method of manufacturing pellicle, and method of manufacturing semiconductor device
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Application No.: US18002692Application Date: 2021-08-03
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Publication No.: US12078923B2Publication Date: 2024-09-03
- Inventor: Yousuke Ono
- Applicant: MITSUI CHEMICALS, INC.
- Applicant Address: JP Tokyo
- Assignee: MITSUI CHEMICALS, INC.
- Current Assignee: MITSUI CHEMICALS, INC.
- Current Assignee Address: JP Tokyo
- Agency: BUCHANAN, INGERSOLL & ROONEY PC
- Priority: JP 20133262 2020.08.05
- International Application: PCT/JP2021/028798 2021.08.03
- International Announcement: WO2022/030498A 2022.02.10
- Date entered country: 2022-12-21
- Main IPC: G03F1/64
- IPC: G03F1/64 ; G03F7/00
Abstract:
Disclosed is a pellicle including a pellicle membrane including a carbon-based membrane having a carbon content of 40% by mass or more and a support frame that supports the pellicle membrane, in which the pellicle membrane and the support frame are in contact with each other, and at least one of the following conditions 1 and 2 is satisfied. [Condition 1] In the support frame, a surface in contact with the pellicle membrane has a roughness Ra of 1.0 μm or less. [Condition 2] The support frame has a width of unevenness of 10 μm or less at an edge portion on a surface side in contact with the pellicle membrane and on an inner side of the pellicle.
Public/Granted literature
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