A photoresist feeding device includes a cleaning member and a storage member. The cleaning member includes a first photoresist inlet and a first photoresist outlet. The storage member includes a second photoresist inlet and a second photoresist outlet. The first photoresist outlet is connected with the second photoresist inlet. An ultrasonic generator is arranged in the cleaning member, and the ultrasonic generator is configured to generate ultrasonic waves for separating bubbles of a photoresist solution in the cleaning member from the photoresist solution, and for gathering impurity particles in the photoresist solution. The storage member is configured to store the photoresist solution that has been subjected to ultrasonic treatment.