Invention Grant
- Patent Title: Photoelectric detection substrate and manufacturing method thereof, and photoelectric detection device
-
Application No.: US17432422Application Date: 2021-02-22
-
Publication No.: US12080812B2Publication Date: 2024-09-03
- Inventor: Kui Liang , Tuo Sun , Yichi Zhang
- Applicant: Beijing BOE Technology Development Co., Ltd. , BOE Technology Group Co., Ltd.
- Applicant Address: CN Beijing
- Assignee: Beijing BOE Technology Development Co., Ltd.,BOE Technology Group Co., Ltd.
- Current Assignee: Beijing BOE Technology Development Co., Ltd.,BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing; CN Beijing
- Agency: IPro, PLLC
- Priority: CN 2010199954.5 2020.03.20
- International Application: PCT/CN2021/077213 2021.02.22
- International Announcement: WO2021/185025A 2021.09.23
- Date entered country: 2021-08-19
- Main IPC: H01L31/0224
- IPC: H01L31/0224 ; H01L31/042 ; H01L31/18
Abstract:
A photoelectric detection substrate and a manufacturing method thereof, and a photoelectric detection device are provided. The photoelectric detection substrate includes: a base substrate and a semiconductor layer arranged on the base substrate, wherein the semiconductor layer is configured to convert an optical signal into an electrical signal.
Public/Granted literature
- US20230138242A1 PHOTOELECTRIC DETECTION SUBSTRATE AND MANUFACTURING METHOD THEREOF, AND PHOTOELECTRIC DETECTION DEVICE Public/Granted day:2023-05-04
Information query
IPC分类:
