Imprint apparatus forms pattern of imprint material by contacting pattern region of mold with the imprint material and curing the imprint material. The apparatus includes actuators for controlling shape of the pattern region by applying force to the mold and controller for controlling the actuators. Each actuator is given command value defined by sum of first command value for correcting first component, of shape difference between the shot region and the pattern region, that can be approximated by linear function and second command value for correcting second component, of the shape difference, that can be approximated by second- or higher-order function. After determining the first command value, the controller determines adjustment range of the second command value based on the first command value and determines the second command value by setting the adjustment range as restriction.