Invention Grant
- Patent Title: Substrate processing apparatus and substrate processing method
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Application No.: US17287558Application Date: 2019-09-03
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Publication No.: US12087588B2Publication Date: 2024-09-10
- Inventor: Hirotoshi Mori , Yoshihiro Kawaguchi , Kazuya Hisano , Hayato Tanoue
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Shih IP Law Group, PLLC.
- Priority: JP 18199406 2018.10.23
- International Application: PCT/JP2019/034566 2019.09.03
- International Announcement: WO2020/084909A 2020.04.30
- Date entered country: 2021-04-22
- Main IPC: H01L21/304
- IPC: H01L21/304 ; B23K26/53 ; H01L21/306 ; H01L21/67 ; H01L21/68 ; H01L21/687

Abstract:
A substrate processing apparatus includes a holder configured to hold a combined substrate in which a first substrate and a second substrate are bonded to each other; a first detector configured to detect an outer end portion of the first substrate; a second detector configured to detect a boundary between a bonding region where the first substrate and the second substrate are bonded and a non-bonding region located at an outside of the bonding region; a periphery removing device configured to remove a peripheral portion of the first substrate as a removing target from the combined substrate held by the holder.
Public/Granted literature
- US20220359212A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD Public/Granted day:2022-11-10
Information query
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