Invention Grant
- Patent Title: Solid-state imaging device, solid-state imaging device manufacturing method, and electronic device
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Application No.: US17283164Application Date: 2019-10-15
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Publication No.: US12087794B2Publication Date: 2024-09-10
- Inventor: Katsunori Hiramatsu
- Applicant: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Applicant Address: JP Kanagawa
- Assignee: Sony Semiconductor Solutions Corporation
- Current Assignee: Sony Semiconductor Solutions Corporation
- Current Assignee Address: JP Kanagawa
- Agency: SHERIDAN ROSS P.C.
- Priority: JP 18195679 2018.10.17
- International Application: PCT/JP2019/040472 2019.10.15
- International Announcement: WO2020/080356A 2020.04.23
- Date entered country: 2021-04-06
- Main IPC: H01L27/146
- IPC: H01L27/146

Abstract:
Provided is a solid-state imaging device capable of further improving reliability of a solid-state imaging device and further reducing manufacturing cost. Provided is a solid-state imaging device including a second semiconductor substrate provided with a photoelectric conversion unit and a second element, a second insulating layer, a first semiconductor substrate provided with a first element, and a first insulating layer arranged in this order from a light incident side, and including a groove formed on the first semiconductor substrate, in which the groove has a first side wall and a second side wall, and a part of at least one side wall of the first side wall or the second side wall extends in an oblique direction with respect to a surface of the first semiconductor substrate on the light incident side.
Public/Granted literature
- US20210343774A1 SOLID-STATE IMAGING DEVICE, SOLID-STATE IMAGING DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE Public/Granted day:2021-11-04
Information query
IPC分类: