According to one embodiment, a defect management apparatus includes a processor. The processor acquires first information and second information, the first information including first defect positions relating to defects detected with a first device for an inspection target and corresponding first labels indicating classifications of the defects, the second information including second defect positions relating to defects detected with a second device for the inspection target. The processor determines a first defect position corresponding to a second defect position as a corresponding defect position. The processor diverts the first label corresponding to the corresponding defect position as a second label of the second defect position.