A substrate processing method includes step S51, step S52, and step S6. In step S51, a substrate immersed in a rinsing liquid is lifted from the rinsing liquid and the substrate is immersed in a rinsing liquid stored in a tank in a chamber while an organic solvent having a surface tension smaller than that of the rinsing liquid adheres to the substrate. In step S52, the substrate is lifted from the rinsing liquid. In step S6, a vapor of an organic solvent having a surface tension smaller than that of the rinsing liquid is supplied into the chamber in which the lifted substrate exists.