Invention Grant
- Patent Title: Wiring formation method
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Application No.: US17904502Application Date: 2020-03-02
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Publication No.: US12096570B2Publication Date: 2024-09-17
- Inventor: Ryojiro Tominaga , Yoshitaka Hashimoto
- Applicant: FUJI CORPORATION
- Applicant Address: JP Chiryu
- Assignee: FUJI CORPORATION
- Current Assignee: FUJI CORPORATION
- Current Assignee Address: JP Chiryu
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- International Application: PCT/JP2020/008620 2020.03.02
- International Announcement: WO2021/176498A 2021.09.10
- Date entered country: 2022-08-18
- Main IPC: H05K3/46
- IPC: H05K3/46 ; H05K3/12 ; H05K3/32

Abstract:
To provide a wiring formation method that can increase the wiring density in a case where wiring is formed on an inclined surface by three-dimensional additive manufacturing. The wiring formation method of the present disclosure includes a metal member forming step of forming multiple metal members with a first fluid containing metal particles, a resin layer forming step of forming a resin layer including an upper surface and an inclined surface inclined downward from the upper surface, and a connection wiring forming step of forming multiple connection wirings on the inclined surface and the upper surface of the resin layer with a second fluid containing metal particles, and the connection wirings being formed to individually connect the multiple connection wirings to the multiple metal members on a lower surface of the inclined surface.
Public/Granted literature
- US20230112913A1 WIRING FORMATION METHOD Public/Granted day:2023-04-13
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