Skin status monitor and method thereof for electrosurgical apparatuses
Abstract:
A skin status monitoring apparatus that includes one or more sensors for sensing the applied energy density to an operative site in real time based on one or more monitored variables is provided. Based on the sensed applied energy density, the applied power level of the cold plasma beam may be adjusted, such that, the applied energy density to the operative site remains within the beneficial range that achieves the desired physiological effect to the operative site. The skin status monitoring apparatus of the present disclosure may be coupled to a distal end of an electrosurgical device capable of generating cold plasma.
Information query
Patent Agency Ranking
0/0