Invention Grant
- Patent Title: Magnetic levitation gravity compensation device
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Application No.: US17607388Application Date: 2020-04-23
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Publication No.: US12103158B2Publication Date: 2024-10-01
- Inventor: Hui Meng
- Applicant: YinGuan Semiconductor Technology Co., LTD.
- Applicant Address: CN Shanghai
- Assignee: YinGuan Semiconductor Technology Co., LTD.
- Current Assignee: YinGuan Semiconductor Technology Co., LTD.
- Current Assignee Address: CN Shanghai
- Agent Samson G. Yu
- Priority: CN 1910363230.7 2019.04.30 CN 1910628291.1 2019.07.12
- International Application: PCT/CN2020/086358 2020.04.23
- International Announcement: WO2020/221094A 2020.11.05
- Date entered country: 2021-10-28
- Main IPC: H02N15/00
- IPC: H02N15/00 ; B25H1/00 ; F16C32/04 ; G03F7/00

Abstract:
The disclose provides a magnetic levitation gravity compensation device, including: a first permanent magnet, which is cylindrical; a second permanent magnet, which is cylindrical, arranged in the first permanent magnet and radially spaced from the first permanent magnet; and at least one end permanent magnet, which is cylindrical, and is located on at least one of two axial ends of the second permanent magnet and axially spaced from the two axial ends of the second permanent magnet, a center line of the end permanent magnet is configured to coincide with a center line of the second permanent magnet, and a cylinder wall thickness of the end permanent magnet is smaller than that of the second permanent magnet, wherein a magnetization direction of the first permanent magnet is a radial direction, and a magnetization direction of the second permanent magnet and the end permanent magnet is an axial direction.
Public/Granted literature
- US20220224256A1 Magnetic Levitation Gravity Compensation Device Public/Granted day:2022-07-14
Information query
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