Invention Grant
- Patent Title: Micro-electromechanical system and method for fabricating MEMS having protection wall
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Application No.: US17075737Application Date: 2020-10-21
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Publication No.: US12103845B2Publication Date: 2024-10-01
- Inventor: Jung-Hao Chang , Weng-Yi Chen
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsinchu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C
- Main IPC: B81C1/00
- IPC: B81C1/00 ; B81B7/00 ; H04R7/06 ; H04R19/04 ; H04R31/00
Abstract:
A micro electromechanical system (MEMS) includes a substrate, a semiconductor device and a protection wall. The substrate has a surface. The semiconductor device is disposed on the surface. The protection wall has a poly-silicon layer surrounding the semiconductor device and connecting to the surface.
Public/Granted literature
- US20220119248A1 MICRO-ELECTROMECHANICAL SYSTEM AND METHOD FOR FABRICATING MEMS HAVING PROTECTION WALL Public/Granted day:2022-04-21
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