Invention Grant
- Patent Title: Method and system for creating dipole moment model
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Application No.: US17659012Application Date: 2022-04-13
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Publication No.: US12105142B2Publication Date: 2024-10-01
- Inventor: Min-Hsu Tsai , Ruey-Beei Wu
- Applicant: Realtek Semiconductor Corporation
- Applicant Address: TW Hsinchu
- Assignee: Realtek Semiconductor Corporation
- Current Assignee: Realtek Semiconductor Corporation
- Current Assignee Address: TW Hsinchu
- Agency: CKC & Partners Co., LLC
- Priority: TW 0137131 2021.10.06
- Main IPC: G01V3/10
- IPC: G01V3/10 ; G01R31/317 ; H01Q7/00 ; H04B5/73

Abstract:
The present disclosure provides a method and system for creating dipole moment model. The method is applied to a tested circuit and includes: performing a near-field measurement on the tested circuit, to obtain a near-field electric field and a near-field magnetic field related to the tested circuit; performing a two-dimensional divergence calculation on the near-field electric field and the near-field magnetic field, to obtain a near-field electric divergence field and a near-field magnetic divergence field; performing a convolution calculation on the near-field electric divergence field and the near-field magnetic divergence field with a digital filter; and building a dipole moment matrix equivalent to the tested circuit according to a result of the convolution calculation.
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