- Patent Title: Methods for manufacturing phase masks and lens-less camera module
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Application No.: US18168887Application Date: 2023-02-14
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Publication No.: US12108134B2Publication Date: 2024-10-01
- Inventor: Seung Ah Lee , Hye Suk Chae , Yu Jin Lee , Kyung Chul Lee , Nak Kyu Baek , Tae Young Kim , Jae Woo Jung
- Applicant: UIF (University Industry Foundation), Yonsei University
- Applicant Address: KR Seoul
- Assignee: UIF (University Industry Foundation), Yonsei University
- Current Assignee: UIF (University Industry Foundation), Yonsei University
- Current Assignee Address: KR Seoul
- Priority: KR 20220029124 2022.03.08 KR 20220054616 2022.05.03
- Main IPC: H04N23/55
- IPC: H04N23/55 ; G03F1/26 ; G03F1/44 ; G03F7/00 ; H04N23/955

Abstract:
A method for manufacturing a phase mask and a lens-less camera module comprises the steps of: obtaining a replica mold on which an inverted phase shift pattern is formed in which a phase shift pattern of a master phase mask spaced apart from an image sensor is inverted; calculating a thickness of a phase mask disposed on the image sensor replacing the master phase mask; arranging a photocurable material for implementing the phase mask on the image sensor to a calculated thickness, placing the replica mold on an upper surface of the photocurable material, and then curing the photocurable material; and removing the replica mold from the top of the phase mask, so that the focal distance change or parallel movement does not occur depending on the position of the phase mask.
Public/Granted literature
- US20230291986A1 METHODS FOR MANUFACTURING PHASE MASKS AND LENS-LESS CAMERA MODULE Public/Granted day:2023-09-14
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