Invention Grant
- Patent Title: Solid-state imaging device, method for manufacturing solid-state imaging device, and electronic apparatus
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Application No.: US17916418Application Date: 2021-03-30
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Publication No.: US12108180B2Publication Date: 2024-10-01
- Inventor: Ken Miyauchi , Kazuya Mori
- Applicant: Brillnics Singapore Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: BRILLNICS SINGAPORE PTE. LTD.
- Current Assignee: BRILLNICS SINGAPORE PTE. LTD.
- Current Assignee Address: SG Singapore
- Agency: Pillsbury Winthrop Shaw
- Priority: JP 20060221 2020.03.30
- International Application: PCT/JP2021/013633 2021.03.30
- International Announcement: WO2021/201000A 2021.10.07
- Date entered country: 2022-09-30
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H04N25/771 ; H04N25/78 ; H04N25/79

Abstract:
A source follower element is adjacent to a first lateral part of a floating diffusion in a first direction orthogonal to the first lateral part, a reset element is adjacent to a second lateral part of the floating diffusion in the first direction, and the floating diffusion and the source follower element are connected through a wiring. Some of the photoelectric conversion elements are adjacent to each other in a second direction and spaced away from each other with a first spacing therebetween that allows at least the source follower element and the reset element to be formed therein. Some of the photoelectric conversion elements are adjacent to each other in the first direction and spaced away from each other with a second spacing therebetween that is less than the first spacing.
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Information query
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