• Patent Title: Photodynamic method of inhibiting growth of a microbial plant pathogen
  • Application No.: US17278657
    Application Date: 2019-09-24
  • Publication No.: US12108756B2
    Publication Date: 2024-10-08
  • Inventor: Christopher Brian FranceWilliam Bell
  • Applicant: TDA Research, Inc
  • Applicant Address: US CO Wheat Ridge
  • Assignee: TDA Research, Inc.
  • Current Assignee: TDA Research, Inc.
  • Current Assignee Address: US CO Wheat Ridge
  • Agent Brian J Elliott; Grace B Clinger
  • International Application: PCT/US2019/052796 2019.09.24
  • International Announcement: WO2021/061109A 2021.04.01
  • Date entered country: 2021-03-23
  • Main IPC: A01N25/00
  • IPC: A01N25/00 A01N59/20
Photodynamic method of inhibiting growth of a microbial plant pathogen
Abstract:
We describe methods and materials for inhibiting the growth of a microbial pathogen of a plant. The method comprises the steps of applying to the plant a combination of a dye-bearing compound which is a reactive oxygen species photosensitizer; and a copper compound, which increases the microbial lethality of the dye-bearing compound towards the microbial pathogen; and exposing the plant to light to activate the combination of the dye-bearing compound and the copper compound and inhibiting growth of a microbial pathogen of a plant. The combination of the dye-bearing compound and the copper compound may result in a synergistic ability to reduce the growth of a plant pathogen.
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