• Patent Title: Poly(arylene ether ketone) resin, method for producing the same, and molded article
  • Application No.: US17414591
    Application Date: 2019-12-05
  • Publication No.: US12110364B2
    Publication Date: 2024-10-08
  • Inventor: Ryuichi MatsuokaMasaya MasumotoKatsuya Maeyama
  • Applicant: DIC Corporation
  • Applicant Address: JP Tokyo
  • Assignee: DIC Corporation
  • Current Assignee: DIC Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Locke Lord LLP
  • Agent James E. Armstrong, IV; Nicholas J. DiCeglie, Jr.
  • Priority: JP 18241642 2018.12.25
  • International Application: PCT/JP2019/047632 2019.12.05
  • International Announcement: WO2020/137420A 2020.07.02
  • Date entered country: 2021-06-16
  • Main IPC: C08K7/02
  • IPC: C08K7/02 C08G65/40
Poly(arylene ether ketone) resin, method for producing the same, and molded article
Abstract:
Provided is a poly(arylene ether ketone) resin which inhibits reactions such as molecular weight extension and crosslinking in a high-temperature molten state and which is excellent in melt viscosity stability and molding processability. The poly(arylene ether ketone) resin contains an alkylsulfonyl group represented by general formula (1). In the formula, R is an alkyl group containing one to four carbon atoms.
Information query
Patent Agency Ranking
0/0