Invention Grant
- Patent Title: Symmetric FET for RF nonlinearity improvement
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Application No.: US17225625Application Date: 2021-04-08
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Publication No.: US12113057B2Publication Date: 2024-10-08
- Inventor: Tero Tapio Ranta
- Applicant: pSemi Corporation
- Applicant Address: US CA San Diego
- Assignee: pSemi Corporation
- Current Assignee: pSemi Corporation
- Current Assignee Address: US CA San Diego
- Agency: JAQUEZ LAND GREENHAUS & McFARLAND LLP
- Agent Alessandro Steinfl, Esq.
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L21/768 ; H01L21/84 ; H01L23/482 ; H01L23/66 ; H01L27/06 ; H01L27/12 ; H01L29/417

Abstract:
A physical layout of a symmetric FET is described which provides symmetry in voltages coupled to structures of the FET so to reduce OFF state asymmetry in capacitances generated by the structures when the FET is used as a switch. According to one aspect, the symmetric FET is divided into two halves that are electrically coupled in parallel. Gate structures of the two half FETs are arranged in the middle region of the layout, each gate structure having gate fingers that project towards opposite directions. Interdigitated source and drain structures run along the gate fingers and include crossover structures that cross source and drain structures in the middle region of the layout. The gate structures share a body contact region that is arranged in the middle of the layout between the two gate structures.
Public/Granted literature
- US20210335773A1 Symmetric FET for RF Nonlinearity Improvement Public/Granted day:2021-10-28
Information query
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