Invention Grant
- Patent Title: Semiconductor device
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Application No.: US17645843Application Date: 2021-12-23
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Publication No.: US12113104B2Publication Date: 2024-10-08
- Inventor: Koshi Hamano
- Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: IPUSA, PLLC
- Priority: JP 21049890 2021.03.24
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/08 ; H01L23/00

Abstract:
A semiconductor device includes a gate interconnect, extending in a first direction, and configured to transmit an input signal, and a transistor including gate electrodes extending in a second direction perpendicular to the first direction, and spaced apart from one another, and connected to the gate interconnect, and source and drain regions alternately arranged along the first direction, so that each gate electrode is sandwiched between the source and drain region which are adjacent to each other. The semiconductor device also includes drain interconnects, arranged above the drain regions, and connected to the drain regions, respectively, an output interconnect, connected to the drain interconnects, and configured to transmit an output signal output from the drain regions, and stubs connected to the drain interconnects, respectively. At least one of the stubs is connected to one of the drain interconnects at an end opposite from the gate interconnect.
Public/Granted literature
- US20220310788A1 SEMICONDUCTOR DEVICE Public/Granted day:2022-09-29
Information query
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