- Patent Title: Semiconductor device, array structure of semiconductor devices, neuromorphic circuit including the semiconductor devices, and computing apparatus including the neuromorphic circuit
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Application No.: US17716460Application Date: 2022-04-08
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Publication No.: US12113129B2Publication Date: 2024-10-08
- Inventor: Jaechul Park , Youngkwan Cha
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR 20210103477 2021.08.05
- Main IPC: H01L51/30
- IPC: H01L51/30 ; H01L29/51 ; H01L29/78 ; H10B51/30

Abstract:
A semiconductor device includes a semiconductor layer extending in a first direction and including a source region and a drain region, which are apart from each other in the first direction; an insulating layer surrounding the semiconductor layer; a first gate electrode layer surrounding the insulating layer; a ferroelectric layer provided on the first gate electrode layer; and a second gate electrode layer provided on the ferroelectric layer.
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