Invention Grant
- Patent Title: Method for manufacturing display device, and display device
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Application No.: US17270446Application Date: 2018-08-24
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Publication No.: US12114540B2Publication Date: 2024-10-08
- Inventor: Yohsuke Kanzaki , Seiji Kaneko , Takao Saitoh , Masahiko Miwa , Masaki Yamanaka , Yi Sun
- Applicant: SHARP KABUSHIKI KAISHA
- Applicant Address: JP Sakai
- Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee Address: JP Sakai
- Agency: ScienBiziP, P.C.
- International Application: PCT/JP2018/031411 2018.08.24
- International Announcement: WO2020/039588A 2020.02.27
- Date entered country: 2021-02-23
- Main IPC: H10K59/124
- IPC: H10K59/124 ; H01L29/66 ; H01L29/786 ; H10K59/12 ; H10K59/131

Abstract:
A display device (1) includes: a substrate (2); and a first transistor (1a) formed on the substrate (2). The first transistor (1a) includes: an oxide semiconductor layer (4) formed on the substrate (2); a gate insulating layer (5) formed on the oxide semiconductor layer (4); and a gate electrode (6) formed on the gate insulating layer (5). The oxide semiconductor layer (4) includes: a conductive region (4a) provided with conductivity; a first resistance region (4b) positioned below the gate electrode (6); and a second resistance region (4c) provided between the conductive region (4a) and the first resistance region (4b), and positioned outside the gate electrode (6). The first resistance (4b) is larger in resistance than the second resistance region (4c).
Public/Granted literature
- US20210257427A1 METHOD FOR MANUFACTURING DISPLAY DEVICE, AND DISPLAY DEVICE Public/Granted day:2021-08-19
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