Invention Grant
- Patent Title: Flow device and flow method for an additive manufacturing device and an additive manufacturing device with such a flow device
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Application No.: US17289952Application Date: 2019-11-06
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Publication No.: US12115722B2Publication Date: 2024-10-15
- Inventor: Alexander Schilling , Sebastian Mehl , Franz-Josef Kerl
- Applicant: EOS GmbH Electro Optical Systems
- Applicant Address: DE Krailling
- Assignee: EOS GmbH Electro Optical Systems
- Current Assignee: EOS GmbH Electro Optical Systems
- Current Assignee Address: DE Krailling
- Agency: Polsinelli PC
- Priority: DE 2018219304.5 2018.11.12
- International Application: PCT/EP2019/080396 2019.11.06
- International Announcement: WO2020/099214A 2020.05.22
- Date entered country: 2021-04-29
- Main IPC: B33Y10/00
- IPC: B33Y10/00 ; B22F10/28 ; B22F10/322 ; B22F10/77 ; B22F12/20 ; B22F12/70 ; B29C64/153 ; B33Y30/00 ; B22F12/17

Abstract:
Disclosed is a flow device for an additive manufacturing device. The device includes a gas supply line located outside the process chamber to conduct gas to a gas inlet. The gas supply line includes a first line section extending in a first extension direction and a maximum width that extends transverse to the first extension direction and parallel to the build area. A length of the first line section is at least half as large as the maximum value of the width. The first line section also includes a first subsection spaced from the gas inlet and including a first flow conditioning unit and a wall of the first line section. The first flow conditioning unit substantially aligns the gas stream in the first extension direction.
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Information query