An arrangement and a method for the gradual shutoff of potential in high voltage technology. The arrangement has at least one armature body, an electrically insulating film, and electrically conductive regions. The electrically conductive regions are arranged between layers of the electrically insulating films, and at least parts of the electrically insulating film are arranged around the at least one armature body. The arrangement is used in direct current applications. Resistive compensation currents are reduced and/or avoided along the electrically insulating film, and/or by an armature body, which functions as a first gradual potential shutoff coating, and/or by way of the electrical contacting of the outermost electrically conductive region between layers of electrically insulating film via an electrical contact through an opening in the outer layer of the insulating film.