Invention Grant
- Patent Title: Semiconductor device and method forming the same
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Application No.: US17847632Application Date: 2022-06-23
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Publication No.: US12131973B2Publication Date: 2024-10-29
- Inventor: Hsiu-Mei Yu , Guang-Yuan Jiang , Cheng-Yi Hsieh , Wei-Chan Chang , Chang-Sheng Lin
- Applicant: Vanguard International Semiconductor Corporation
- Applicant Address: TW Hsinchu
- Assignee: VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION
- Current Assignee: VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L23/367
- IPC: H01L23/367 ; H01L21/02 ; H01L21/28 ; H01L21/48

Abstract:
A semiconductor device includes: a substrate; a seed layer disposed on the substrate; a compound semiconductor stack layer disposed on the seed layer; and a source metal layer and a drain metal layer disposed on the compound semiconductor stack layer. The semiconductor device further includes a conductive layer at least partially covering the source metal layer and the drain metal layer, and covering opposing side surfaces of the seed layer and opposing side surfaces of the compound semiconductor stack layer. The conductive layer electrically connects the seed layer and the source metal layer.
Public/Granted literature
- US20230420328A1 SEMICONDUCTOR DEVICE AND METHOD FORMING THE SAME Public/Granted day:2023-12-28
Information query
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