Invention Grant
- Patent Title: Magnetic memory element including perpendicular enhancement layers and dual oxide cap layers
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Application No.: US18238481Application Date: 2023-08-26
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Publication No.: US12133471B2Publication Date: 2024-10-29
- Inventor: Zihui Wang , Yiming Huai
- Applicant: Avalanche Technology, Inc.
- Applicant Address: US CA Fremont
- Assignee: Avalanche Technology, Inc.
- Current Assignee: Avalanche Technology, Inc.
- Current Assignee Address: US CA Fremont
- Agent Bing K. Yen
- Main IPC: H10N50/10
- IPC: H10N50/10 ; B82Y40/00 ; G11C11/15 ; G11C11/16 ; H01F10/32 ; H01F41/30 ; H01L29/66 ; H10B61/00 ; H10N50/80 ; H10N50/85

Abstract:
A magnetic memory element including first and second magnetic free layers having a variable magnetization direction substantially perpendicular to layer planes thereof; a first perpendicular enhancement layer (PEL) interposed between the first and second magnetic free layers; first and second magnetic reference layers having a first invariable magnetization direction substantially perpendicular to layer planes thereof; a second PEL interposed between the first and second magnetic reference layers; an insulating tunnel junction layer formed between the first magnetic free layer and reference layer; an anti-ferromagnetic coupling layer formed adjacent to the second magnetic reference layer; a magnetic fixed layer formed adjacent to the anti-ferromagnetic coupling layer and having a second invariable magnetization direction substantially opposite to the first invariable magnetization direction; a non-magnetic layer comprising oxygen and a transition metal and formed adjacent to the second magnetic free layer; and a magnesium oxide layer formed adjacent to the non-magnetic layer.
Public/Granted literature
- US20230403945A1 Magnetic Memory Element Including Perpendicular Enhancement Layers and Dual Oxide Cap Layers Public/Granted day:2023-12-14
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