Invention Grant
- Patent Title: Pressure control device and substrate treatment apparatus including the same
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Application No.: US18182577Application Date: 2023-03-13
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Publication No.: US12134271B2Publication Date: 2024-11-05
- Inventor: Dong Hwa Lee , Dai Geon Yoon , Bong Man Choi , Jong Suk Won , Hyeong Jun Cho
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Cheonan-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2022-0183963 20221226
- Main IPC: B41J2/045
- IPC: B41J2/045 ; B41J2/14

Abstract:
Provided is a pressure control device for stably controlling the internal air pressure of a reservoir. The pressure control device includes: an input terminal receiving source air pressure; an intake valve connected between the input terminal and an output terminal; an exhaust valve connected to the output terminal; a pressure sensor connected to the output terminal and generating a sensed value by sensing pressure at the output terminal; and a controller simultaneously operating the intake valve and the exhaust valve by simultaneously operating a first control loop for adjusting the degree of opening of the intake valve by comparing the sensed value with a first target value and a second control loop for adjusting the degree of opening of the exhaust valve by comparing the sensed value with a second target value.
Public/Granted literature
- US20240208211A1 PRESSURE CONTROL DEVICE AND SUBSTRATE TREATMENT APPARATUS INCLUDING THE SAME Public/Granted day:2024-06-27
Information query
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