Invention Grant
- Patent Title: Magnetoresistive element with free-layer and method of manufacturing same
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Application No.: US17317675Application Date: 2021-05-11
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Publication No.: US12135226B2Publication Date: 2024-11-05
- Inventor: Jochen Schmitt , Cian Padraic O Dalaigh , Md Tarequzzaman , Onur Necdet Urs , Jan Kubik , Enno Lage
- Applicant: Analog Devices International Unlimited Company
- Applicant Address: IE County Limerick
- Assignee: Analog Devices International Unlimited Company
- Current Assignee: Analog Devices International Unlimited Company
- Current Assignee Address: IE County Limerick
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Main IPC: G01D5/16
- IPC: G01D5/16 ; H01F10/32 ; B62D15/02

Abstract:
A giant magnetoresistance (GMR) element is provided for use in a magnetic multi-turn sensor in which the free layer, that is, the layer that changes its magnetization direction in response to an external magnetic field so as to provide a resistance change, is thick enough to provide good shape anisotropy without exhibiting an AMR effect. To achieve this, at least a portion of the free layer comprises a plurality of layers of at least two different materials, specifically, a plurality of layers of at least a first material that is ferromagnetic and a plurality of layers of at least a second material that is known not to exhibit an AMR effect and that does not interfere with the GMR effect of the layers of ferromagnetic material.
Public/Granted literature
- US20210372820A1 MAGNETORESISTIVE ELEMENT AND METHOD OF MANUFACTURE Public/Granted day:2021-12-02
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