Invention Grant
- Patent Title: Reflective mask blank and reflective mask
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Application No.: US18526463Application Date: 2023-12-01
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Publication No.: US12135496B2Publication Date: 2024-11-05
- Inventor: Yohei Ikebe , Tsutomu Shoki , Takahiro Onoue , Hirofumi Kozakai
- Applicant: HOYA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HOYA CORPORATION
- Current Assignee: HOYA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Kilpatrick Townsend & Stockton LLP
- Priority: JP2017-040043 20170303,JP2017-107394 20170531
- Main IPC: G03F1/24
- IPC: G03F1/24 ; G03F1/26
Abstract:
A reflective mask blank, having a phase shift film having little dependence of phase difference and reflectance on film thickness, and a reflective mask.
Public/Granted literature
- US20240103354A1 REFLECTIVE MASK BLANK AND REFLECTIVE MASK Public/Granted day:2024-03-28
Information query
