Invention Grant
- Patent Title: Device for reducing misalignment between sputtering target and shield
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Application No.: US18195985Application Date: 2023-05-11
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Publication No.: US12136543B2Publication Date: 2024-11-05
- Inventor: Bo Liu
- Applicant: Honeywell International Inc.
- Applicant Address: US NC Charlotte
- Assignee: Honeywell International Inc.
- Current Assignee: Honeywell International Inc.
- Current Assignee Address: US NC Charlotte
- Agency: Faegre Drinker Biddle & Reath LLP
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/34

Abstract:
A spacing guide for use on a dark space shield of a sputtering chamber includes a horizontal body having a first end, a second end opposite the first end and a thickness, the horizontal body configured to rest on an end of the dark space shield; a first leg extending laterally from the first end of the horizontal body and configured to rest against an outer surface of the dark space shield; and a second leg extending laterally from the second end of the horizontal body and configured to rest against the inner surface of the shield.
Public/Granted literature
- US20240021422A1 DEVICE FOR REDUCING MISALIGNMENT BETWEEN SPUTTERING TARGET AND SHIELD Public/Granted day:2024-01-18
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