Invention Grant
- Patent Title: Imaging element and imaging device with selection and amplication transistor gates formed on same silicon channel
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Application No.: US18468002Application Date: 2023-09-15
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Publication No.: US12136635B2Publication Date: 2024-11-05
- Inventor: Naohiko Kimizuka
- Applicant: Sony Semiconductor Solutions Corporation
- Applicant Address: JP Kanagawa
- Assignee: Sony Semiconductor Solutions Corporation
- Current Assignee: Sony Semiconductor Solutions Corporation
- Current Assignee Address: JP Kanagawa
- Agency: Michael Best & Friedrich LLP
- Priority: JP2018-239623 20181221
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H01L29/78 ; H04N25/77

Abstract:
An imaging element and device configured for reduced image quality deterioration are disclosed. In one example, a pixel unit of the imaging element includes a selection transistor and an amplification transistor each constituted by a multigate transistor. The selection transistor and amplification transistor may be a FinFET that includes a silicon channel having a fin shape. Moreover, gates of the selection transistor and the amplification transistor may be formed on an identical silicon channel having a fin shape. Furthermore, for example, an ion having a smaller thermal diffusivity than a thermal diffusivity of boron or phosphorous is injected into the silicon channel of the selection transistor. In addition, for example, a work function of a material of a gate electrode of the selection transistor is different from a work function of a material of a gate electrode of the amplification transistor.
Public/Granted literature
- US20240021630A1 IMAGING ELEMENT AND IMAGING DEVICE Public/Granted day:2024-01-18
Information query
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