Invention Grant
- Patent Title: Schottky diode and method for fabricating the same
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Application No.: US17612831Application Date: 2020-03-24
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Publication No.: US12136676B2Publication Date: 2024-11-05
- Inventor: You Seung Rim , Tai Young Kang , Sin Su Kyoung
- Applicant: POWER CUBESEMI INC.
- Applicant Address: KR Gyeonggi-do
- Assignee: POWER CUBESEMI INC.
- Current Assignee: POWER CUBESEMI INC.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Grossman, Tucker, Perreault & Pfleger, PLLC
- Agent Donald J. Perreault
- Priority: KR10-2019-0059050 20190520
- International Application: PCT/KR2020/004013 WO 20200324
- International Announcement: WO2020/235796 WO 20201126
- Main IPC: H01L29/872
- IPC: H01L29/872 ; H01L29/06 ; H01L29/47 ; H01L29/66

Abstract:
Schottky diode and method for fabricating the same disclosed. The Schottky diode includes a gallium oxide layer that is a semiconductor layer doped with a first-type dopant, a cathode in ohmic contact with the gallium oxide layer and an anode having a Schottky contact metal layer in Schottky contact with the gallium oxide layer. The gallium oxide layer is in contact with an interface with the Schottky contact metal layer, contains a second-type dopant of a conductivity opposite to that of the first-type dopant, and has an interlayer which is a region where a concentration of the second-type dopant decreases as it moves away from an interface with the Schottky contact metal layer.
Public/Granted literature
- US20220223746A1 SCHOTTKY DIODE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2022-07-14
Information query
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