Invention Grant
- Patent Title: Method and apparatus for laser annealing
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Application No.: US17722014Application Date: 2022-04-15
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Publication No.: US12148615B2Publication Date: 2024-11-19
- Inventor: Paul Van Der Wilt
- Applicant: Coherent LaserSystems GmbH & Co. KG
- Applicant Address: DE Göttingen
- Assignee: Coherent LaserSystems GmbH & Co. KG
- Current Assignee: Coherent LaserSystems GmbH & Co. KG
- Current Assignee Address: DE Göttingen
- Agency: Morrison & Foerster LLP
- Main IPC: C30B13/30
- IPC: C30B13/30 ; B23K26/06 ; B23K26/0622 ; B23K26/53 ; G02B27/09 ; H01L21/02 ; B23K103/00

Abstract:
A layer on a substrate is laser annealed by pulses in a plurality of laser beams formed into a uniform line beam. The laser beams are partitioned into a first set of beams and a second set of beams. The second set of beams is incident onto the layer from a smaller range of angles than all of the beams combined. Pulses in the beams are synchronized such that pulses in the first set of beams are incident on the layer before pulses in the second set of beams. Pulses in the first set of beams melt the layer and pulses in the second set of beams sustain melting.
Public/Granted literature
- US20220359197A1 METHOD AND APPARATUS FOR LASER ANNEALING Public/Granted day:2022-11-10
Information query
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