Invention Grant
- Patent Title: Photoelectric conversion apparatus and manufacturing method therefor
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Application No.: US17218377Application Date: 2021-03-31
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Publication No.: US12148848B2Publication Date: 2024-11-19
- Inventor: Masashi Kusukawa
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Venable LLP
- Priority: JP2020-069146 20200407
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H01L31/0392

Abstract:
A photoelectric conversion apparatus includes a semiconductor substrate having a first surface and a second surface, a plurality of photoelectric conversion regions including an impurity of a first conductivity type and arranged at the semiconductor substrate, a trench arranged between the photoelectric conversion regions, an impurity region including an impurity of a second conductivity type opposite to the first conductivity type and arranged along a sidewall of the trench, and a first film arranged at the first surface of the semiconductor substrate and the sidewall of the trench. The impurity region includes a first region with an impurity concentration of a first concentration and a second region with an impurity concentration of a second concentration lower than the first concentration, and a distance between the first surface and the first region is smaller than a distance between the first surface and the second region.
Public/Granted literature
- US20210313477A1 PHOTOELECTRIC CONVERSION APPARATUS AND MANUFACTURING METHOD THEREFOR Public/Granted day:2021-10-07
Information query
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