Invention Grant
- Patent Title: Gas supply determination method and plasma generator
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Application No.: US17265424Application Date: 2018-08-28
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Publication No.: US12154764B2Publication Date: 2024-11-26
- Inventor: Shinji Takikawa , Takahiro Jindo
- Applicant: FUJI CORPORATION
- Applicant Address: JP Chiryu
- Assignee: FUJI CORPORATION
- Current Assignee: FUJI CORPORATION
- Current Assignee Address: JP Chiryu
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- International Application: PCT/JP2018/031693 WO 20180828
- International Announcement: WO2020/044427 WO 20200305
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
In a plasma generator having a first supply port and a second supply port, in which the plasma generator includes a first supply device for supplying a first gas from the first supply port, and a second supply device connected to the first supply device so as to supply a second gas from the second supply port, a gas supply determination method includes a first supply step of causing the first supply device to start supplying the first gas in a state where the second supply device stops supplying the second gas, a first measurement step of measuring a flow rate of the gas supplied to the first supply port after the first supply step, and a first notification step of notifying a supply state of the first gas in the first supply port in accordance with a flow rate measurement result of the first measurement step.
Public/Granted literature
- US20210313155A1 GAS SUPPLY DETERMINATION METHOD AND PLASMA GENERATOR Public/Granted day:2021-10-07
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