Invention Grant
- Patent Title: Electromagnetic wave shielding film, and method for manufacturing same
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Application No.: US18245299Application Date: 2021-08-25
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Publication No.: US12156390B2Publication Date: 2024-11-26
- Inventor: Byungsung Kim , Seungnam Cha , Sangyeon Pak , Taehun Kim
- Applicant: LG ELECTRONICS INC. , RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
- Applicant Address: KR Seoul; KR Gyeonggi-do
- Assignee: LG ELECTRONICS INC.,RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
- Current Assignee: LG ELECTRONICS INC.,RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
- Current Assignee Address: KR Seoul; KR Gyeonggi-do
- Agency: LEE, HONG, DEGERMAN, KANG & WAIMEY
- Priority: KR10-2020-0120749 20200918
- International Application: PCT/KR2021/011351 WO 20210825
- International Announcement: WO2022/059953 WO 20220324
- Main IPC: H05K9/00
- IPC: H05K9/00

Abstract:
An electromagnetic wave shielding film having: a base substrate; and an electromagnetic wave shielding layer disposed on the base substrate, where the thickness of the electromagnetic wave shielding layer is 1 nm to 50 nm. In addition, the shielding layer includes: a first layer on the base substrate; a second layer on the first layer; and a third layer on the second layer, wherein the first layer, the second layer, and the third layer include copper sulfide.
Public/Granted literature
- US20230363126A1 ELECTROMAGNETIC WAVE SHIELDING FILM, AND METHOD FOR MANUFACTURING SAME Public/Granted day:2023-11-09
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