- Patent Title: Silicon carbide composite wafer and manufacturing method thereof
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Application No.: US17499226Application Date: 2021-10-12
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Publication No.: US12159855B2Publication Date: 2024-12-03
- Inventor: Yan-Kai Zeng , Bai-Xuan Jiang
- Applicant: Hong Chuang Applied Technology Co., Ltd
- Applicant Address: TW Zhubei
- Assignee: Hong Chuang Applied Technology Co., Ltd
- Current Assignee: Hong Chuang Applied Technology Co., Ltd
- Current Assignee Address: TW Zhubei
- Agency: MUNCY, GEISSLER, OLDS & LOWE, P.C.
- Priority: TW110118804 20210525
- Main IPC: B32B7/04
- IPC: B32B7/04 ; B32B17/06 ; B32B18/00 ; C30B29/36 ; C30B33/06 ; H01L21/02 ; H01L21/762 ; H01L23/00

Abstract:
The present invention provides a silicon carbide composite wafer and a manufacturing method thereof. The silicon carbide composite wafer includes (a) a silicon carbide material and (b) a wafer substrate, and the upper surface of the wafer substrate is bonded to the lower surface of the silicon carbide material, wherein the lower surface of the silicon carbide material and/or the upper surface of the wafer substrate undergo a surface modification, thereby allowing the silicon carbide material to be bonded to the wafer substrate directly and firmly. The technical effects of the present invention include achieving strong bonding between the wafer and the substrate, reducing manufacturing process, increasing yield rate, and achieving high industrial applicability.
Public/Granted literature
- US20220384385A1 SILICON CARBIDE COMPOSITE WAFER AND MANUFACTURING METHOD THEREOF Public/Granted day:2022-12-01
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